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Extended X-ray absorption fine structure study of sulphur poisoned Ni/SiO2 catalysts |
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| Authors: | A. Aguinaga, M. Montes, P. Malet, M.J. Capit n, I. Carrizosa,J.A. Odriozola |
| Affiliation: | aGrupo de Ingeniería Química, Facultad de Ciencias Químicas de San Sebastidn, Universidad de1 Pais Vasco, P.O. Box 1072, E-28080 San Sebastián, Spain bDepartamento de Química Inorgánica e Institute de Ciencia de Materiales de Sevilla, Universidad de Sevilla-CSIC, P.O. Box 874, E-41080 Sevilla, Spain |
| Abstract: | Extended X-ray absorption fine structure analysis was performed of the oscillations at the Ni K edge of Ni/SiO2 catalysts completely deactivated by thiophene and partially regenerated by oxidationreduction cycles. The obtained data demonstrates that during the regeneration process sintering of the metalparticles takes place. Besides this, the best fit of the completely sulphided catalysts requires the presence of a sulphur shell in the nickel coordination sphere. The average coordination number of sulphur as well as the Ni-S distance suggest the formation of an in depthsulphide layer during the poisoning process. This implies a reconstruction of the metal particles when interacting at 0.034 kPa and 473 K with thiophene. |
| Keywords: | catalyst characterization (EXAFS) extended X- ray absorption fine structure nickel/silica poisoning sintering sulphur thiophene |
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