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| IC工艺用超纯水系统的TOC实验研究 | |
| 引用本文： | 王铁坤,华卫群. IC工艺用超纯水系统的TOC实验研究[J]. 微纳电子技术, 2003, 40(3): 33-38 |
| 作者姓名： | 王铁坤 华卫群 |
| 作者单位： | 无锡微电子科研中心,江苏 无锡 214035 |
| 摘 要： | 从运行管理角度,以实验方法考察了IC工艺用超纯水制造过程中TOC(总有机碳)的若干问题。通过在线测量一次纯水、二次纯水的TOC含量和相应的数据统计,评估了水平各异的两套超纯水制造系统中各主要装置对TOC的除去效率及其对TOC的影响。 |
| 关 键 词： | 超纯水 TOC 一次纯水 二次纯水 膜脱气 TOC-UV |
| 文章编号： | 1671-4776(2003)03-0033-06 |
| 修稿时间： | 2002-11-22 |
TOC experiments on ultrapure water system for IC fabrication |
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| WANG Tie-kun,HUA Wei-qun. TOC experiments on ultrapure water system for IC fabrication[J]. Micronanoelectronic Technology, 2003, 40(3): 33-38 | |
| Authors: | WANG Tie-kun HUA Wei-qun |
| Abstract: | Experiments have been made to investigate the control of TOG (total organic carbon) in ultrapure water for IC fabrication from the point of view of production managements. Through the data statistics of the on-line TOG content measurements of 1st and 2nd pure water, the effect of the key equipment in two different ultrapure water production systems for removal of TOG is evaluated. |
| Keywords: | ultrapure water TOG 1st pure water 2nd pure water membrane degas TOC-UV |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ | |