| 工作气压对磁控溅射Mo膜的影响 |
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| 引用本文： | 廖国,王冰,张玲,牛忠彩,张志娇,何智兵,杨晓峰,李俊,许华,陈太红,曾体贤,谌家军.工作气压对磁控溅射Mo膜的影响[J].表面技术,2011,40(6):82-84,93. |
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| 作者姓名： | 廖国 王冰 张玲 牛忠彩 张志娇 何智兵 杨晓峰 李俊 许华 陈太红 曾体贤 谌家军 |
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| 作者单位： | 中国工程物理研究院激光聚变研究中心,绵阳621900;西华师范大学物理与电子信息学院,南充637002;中国工程物理研究院激光聚变研究中心,绵阳,621900;西华师范大学物理与电子信息学院,南充,637002 |
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| 基金项目： | 西华师范大学大学生科技创新基金项目(42710071) |
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| 摘 要： | 采用直流磁控溅射沉积技术在不同工作气压下制备Mo膜,研究了工作气压对Mo膜的沉积速率、表面形貌及晶型结构的影响规律,研究表明:工作气压在0.1～0.5 Pa范围内,沉积速率基本保持不变,在0.5～1.5 Pa范围内沉积速率随工作气压的升高而增大；Mo膜的表面粗糙度随工作气压的升高而增加；不同工作气压下制备的Mo膜为立方...
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| 关 键 词： | 直流磁控溅射 Mo薄膜 工作气压 沉积速率 表面形貌 |
Effects of Work Pressure on Mo Films Deposited by DC Magnetron Sputtering |
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| LIAO Guo,WANG Bing,ZHANG Ling,NIU Zhong-cai,ZHANG Zhi-jiao,HE Zhi-bing,YANG Xiao-feng,LI Jun,XU Hua,CHEN Tai-hong,ZENG Ti-xian,CHEN Jia-jun.Effects of Work Pressure on Mo Films Deposited by DC Magnetron Sputtering[J].Surface Technology,2011,40(6):82-84,93. |
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| Authors: | LIAO Guo WANG Bing ZHANG Ling NIU Zhong-cai ZHANG Zhi-jiao HE Zhi-bing YANG Xiao-feng LI Jun XU Hua CHEN Tai-hong ZENG Ti-xian CHEN Jia-jun |
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| Affiliation: | 1.Research Center of Laser Fusion,China Academy of Engineering Physics,Mianyang 621900,China; 2.School of Physics and Electronic Information,China West Normal University,Nanchong 637002,China) |
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| Abstract: | Mo films were fabricated at different sputtering pressure by DC magnetron sputtering.Deposition rate,surface topography and crystal structure of Mo films as the function of work pressure were studied.The results show that,in the pressure range of 0.1 Pa~0.5 Pa,the deposition rate has little changes,while in the pressurerange of 0.5 Pa~1.5 Pa,the deposition rate increases with increasing the sputtering pressure.The surface roughness of Mo films increase with increasing the sputtering pressure.All the Mo films are cubic structure.At lower sputtering pressure,the crystal of Mo film becomes good. |
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| Keywords: | DC magnetron sputtering Mo films work pressure deposition rate surface topography |
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