| 退火温度对Mo薄膜微观结构及形貌的影响 |
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| 引用本文： | 曹德峰,邢丕峰,韦建军,易泰民,杨蒙生,郑凤成,李朝阳,谢军. 退火温度对Mo薄膜微观结构及形貌的影响[J]. 表面技术, 2011, 40(6): 85-87,97 |
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| 作者姓名： | 曹德峰 邢丕峰 韦建军 易泰民 杨蒙生 郑凤成 李朝阳 谢军 |
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| 作者单位： | 中国工程物理研究院激光聚变研究中心,绵阳621900;四川大学原子与分子物理研究所,成都610065;中国工程物理研究院激光聚变研究中心,绵阳,621900;四川大学原子与分子物理研究所,成都,610065 |
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| 摘 要： | 采用直流磁控溅射技术,制备了厚度为3.8μm的Mo薄膜,并对其在不同温度下进行了退火处理。采用白光干涉仪和SEM对Mo薄膜进行了表征,讨论了不同温度对薄膜表面形貌的影响;利用XRD对Mo薄膜的结构进行了分析。结果表明:随着退火温度由450℃升高到1 050℃,晶粒平均尺寸逐渐增大,微曲应力呈减小趋势;在温度高于900℃时,薄膜发生再结晶,同时表面有微裂缝及大量气孔出现;薄膜的表面粗糙度随退火温度的升高有逐步增大的趋势。
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| 关 键 词： | Mo薄膜 微观应力 退火温度 |
Influence of Annealing Temperature on Microstructure and Morphology of Mo Films |
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| CAO De-feng,XING Pi-feng,WEI Jian-jun,YI Tai-min,YANG Meng-sheng,ZHENG Feng-cheng,LI Zhao-yang,XIE Jun. Influence of Annealing Temperature on Microstructure and Morphology of Mo Films[J]. Surface Technology, 2011, 40(6): 85-87,97 |
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| Authors: | CAO De-feng XING Pi-feng WEI Jian-jun YI Tai-min YANG Meng-sheng ZHENG Feng-cheng LI Zhao-yang XIE Jun |
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| Affiliation: | 1(1.Research Center of Laser Fusion,China Academy of Engineering Physics,Mianyang 621900,China;2.Institute of Atomic and Molecular Physics,Sichuan University,Chengdu 610065,China) |
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| Abstract: | The Mo films of 3.8μm was deposited before annealing at 450 ℃~1 050 ℃ by DC magnetron sputtering on Mo substrates.The Mo films was characterized by the white light interferometer,SEM,and the effect of different temperature on the surface morphology of the film was disscussed;The structure of Mo films was analyzed by XRD.The results show that the grain size increases and microstrain decreases with increasing of the annealing temperature from 450 ℃ to 1 050 ℃;The Mo films recrystallizes after annealing at 900 ℃,and appears microcracks and pores;There is a trend that with increasing of the annealing temperature the surface roughness increases. |
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| Keywords: | molybdenum film microstrain annealing temperature |
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