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A study of electron-beam-evaporated MgO films using electron diffraction,optical absorption and cathodoluminescence
Authors:M.O. Aboelfotoh  J.N. Ramsey
Affiliation:Data Systems Division, IBM Corporation, Kingston, NY 12401 U.S.A.;General Technology Division, IBM Corporation, Hopewell Junction, NY 12533 U.S.A.
Abstract:Reflection high energy electron diffraction, optical absorption and cathodoluminescence were used to study MgO films deposited onto fused silica, single- crystal silicon and LiF substrates at various temperatures. Results showed that some of the same optical absorption and emission bands observed in X- or UV- irradiated, additively colored or mechanically deformed MgO crystals were observed in evaporated MgO films. The peak positions and the relative peak intensities of the optical absorption and emission bands depended on the substrate temperature during film deposition as well as on the structure of the film. The effect of heating the films in air and vacuum on the optical absorption and emission bands is also discussed.
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