| 计量光栅盘真空镀铬机理与工艺研究 |
| |
| 引用本文： | 陈赟,王晓峰,李艳茹.计量光栅盘真空镀铬机理与工艺研究[J].长春理工大学学报,2011,34(2). |
| |
| 作者姓名： | 陈赟 王晓峰 李艳茹 |
| |
| 作者单位： | 中国科学院长春光学精密机械与物理研究所,长春,130033;中国科学院长春光学精密机械与物理研究所,长春,130033;中国科学院长春光学精密机械与物理研究所,长春,130033 |
| |
| 基金项目： | 中国科学院长春光学精密机械与物理研究所三期创新项目(Y00332H100) |
| |
| 摘 要： | 在计量光栅盘的制作过程中,真空镀铬是影响计量光栅盘精度和成品率的主要工序之一。为了提高计量光栅盘的精度及成品率,对计量光栅盘真空镀铬原理及膜层形成机理进行了分析,给出了影响铬层致密性及牢固度的主要因素与铬层均匀性和蒸发距离之间的关系式,并针对其原因对相关工艺进行了改进,实验证明改进后的工艺对改善铬膜的致密性和牢固度及均匀性起到了一定的作用,使计量光栅盘的成品率提高了10%,同时也为进一步改善后续工艺提供了理论依据。
|
| 关 键 词： | 真空镀铬 致密性 均匀性 蒸发距离 |
Research on Mechanism and Techniques of Vacuum Plating of Cr on Metrology Grating |
| |
| CHEN Yun,WANG Xiaofeng,LI Yanru.Research on Mechanism and Techniques of Vacuum Plating of Cr on Metrology Grating[J].Journal of Changchun University of Science and Technology,2011,34(2). |
| |
| Authors: | CHEN Yun WANG Xiaofeng LI Yanru |
| |
| Affiliation: | CHEN Yun,WANG Xiaofeng,LI Yanru(Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130033) |
| |
| Abstract: | During the producing metrology grating,vacuum plating of Cr is one of main working procedures affecting the precision and finished product rate of metrology grating.In order to improve the precision and increase finished product rate of metrology grating,we analyze the theory of vacuum plating of Cr on metrology grating and the formation mechanism of Cr film,the main factors affecting compactness and fastness of Cr film are given,the relations between Cr film uniformity and vaporization distance are present... |
| |
| Keywords: | vacuum plating of Cr fastness uniformity vaporization distance |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
