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Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor |
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| Authors: | Hanearl Jung Woo-Hee Kim Il-Kwon Oh Chang-Wan Lee Clement Lansalot-Matras Su Jeong Lee Jae-Min Myoung Han-Bo-Ram Lee Hyungjun Kim |
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