Electrical properties at p-ZnSe/metal interfaces |
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Authors: | T Kawakami Y Koide N Teraguchi Y Tomomura A Suzuki Masanori Murakami |
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Affiliation: | (1) Department of Materials Science and Engineering, Division of Engineering Science, Kyoto University, Sakyo-ku, 606-01 Kyoto, Japan;(2) Central Research Laboratories, Sharp Corporation, Ichinomoto-cho, Tenri, 632 Nara, Japan;(3) Department of Materials Science and Engineering, Division of Engineering Science, Kyoto University, Sakyo-ku, 606-01 Kyoto, Japan |
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Abstract: | In order to prepare low resistance ohmic contacts to p-ZnSn by the “deposition and annealing (DA)” technique which has been
extensively used for GaAs and Si-based devices, formation of a heavily doped layer by the p-ZnSe/metal reaction is required.
For p-ZnSe/Ni contacts, Ni and Se reacted preferentially at the ZnSe/Ni interface upon annealing at temperatures higher than
250°C. However, capacitance-voltage measurements showed that the net acceptor concentration (NA-ND) close to the p-ZnSe/Ni interface was reduced upon the Ni/ZnSe reaction, resulting in high contact resistance. For p-ZnSe/Au
contacts, neither Au/ZnSe reaction nor reduction of the acceptor concentration were observed after annealing at temperatures
lower than 300°C. This indicates that although the metal/p-ZnSe reaction is mandatory to prepare a heavily doped layer, the
reaction induced an increase in the compensation donors in the p-ZnSe substrate. In order to increase the acceptor concentration
in the vicinity of the p-ZnSe/metal interface through diffusion from the contact materials, Li or O which was reported to
play the role of an acceptor in ZnSe was deposited with a contact metal and annealed at elevated temperatures. Ni or Ag was
selected as the contact metal, because these metals were expected to enhance Li or O doping by reacting with ZnSe. However,
the current density-voltage characteristics of the Li(N)/Ni and Ag(O) contacts exhibited rectifying behavior, and the contact
resistances increased with increasing annealing temperature. The present results indicated that, even though the acceptor
concentration in the p-ZnSe substrate increased by diffusion of the dopants from the contact elements, an increment of the
compensation donors was larger than that of the acceptors. The present experiments indicated that preparation of low resistance
ohmic contacts by forming a heavily doped intermediate layer between p-ZnSe and metal is extremely difficult by the DA technique. |
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Keywords: | Contacts deposition and annealing interfaces p-ZnSe/metal |
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