| CVD金刚石薄膜的表面形貌研究 |
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| 引用本文： | 杨国伟 毛友德. CVD金刚石薄膜的表面形貌研究[J]. 微细加工技术, 1993, 0(4): 81-85 |
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| 作者姓名： | 杨国伟 毛友德 |
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| 作者单位： | 航空航天部第014中心，合肥工业大学应用物理系 洛阳 471009，合肥 230009 |
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| 摘 要： | 本工作采用HFCVD方法在Si、Mo衬底上生长出不同晶粒形貌的多晶金刚石薄膜,研究了生长条件(衬底温度、碳源浓度、反应压强)对金刚石薄膜晶粒形貌的影响。结果表明,在HFCVD方法中,金刚石薄膜晶粒形貌对生长条件十分敏感,生长条件的变化会导致不同形貌晶粒的生长。
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| 关 键 词： | 金刚石 薄膜 晶粒形貌 薄膜生长 |
STUDY ON THE SURFACE MORPHOLOGY OF CVD DIAMOND FILMS |
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| Yang Guowei. STUDY ON THE SURFACE MORPHOLOGY OF CVD DIAMOND FILMS[J]. Microfabrication Technology, 1993, 0(4): 81-85 |
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| Authors: | Yang Guowei |
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| Abstract: | Multi - crystal diamond films with different grain morphology grown on Si and Mo substrates by HFCVD are obtained.The influences of various growing conditions(substrate temperature,density of carbon source and reaction pre-ssure)on the grain morphology of diamond film are studied.The results show that the grain morphology of diamond film in HFCVD method is very sensitive to the growing conditions and various growing conditions result in different grain morphology. |
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| Keywords: | diamond film growing conditions grain morphology |
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