| 大尺寸AMOLED显示的技术挑战 |
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| 引用本文： | Hye Dong Kim,Yeon-Gon Mo,石琳,刘珊珊.大尺寸AMOLED显示的技术挑战[J].现代显示,2009,20(5):20-25. |
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| 作者姓名： | Hye Dong Kim Yeon-Gon Mo 石琳 刘珊珊 |
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| 作者单位： | 1. 三星SDI有限公司合作研究开发中心,韩国京畿道龙仁市
2. 北京科技大学 |
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| 摘 要： | 综述了目前大尺寸AMOLED显示的技术挑战,尤其是背板技术。然后论述了如何采用氧化物TFT新技术与LTPS和a-Si TFT的优势相结合制造大尺寸背板的最佳方案。通过对比传统准分子激光退火（ELA）LTPS和非晶铟-镓-氧化锌（a-IGZO）TFT的器件特性,特别揭示了氧化物TFT的挑战性技术。最后,展示了由a-IGZO TFT背板制造的12.1in WXGAAMOLED显示器原型机。
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| 关 键 词： | 结晶化技术 低温多晶硅 非晶铟-镓-氧化锌 |
| 收稿时间： | 2009/3/18 |
Technological Challenges for Large-Size AMOLED Display |
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| Hye Dong Kim,Jae Kyeong Jeong,Hyun-Joong Chung,Yeon-Gon Mo.Technological Challenges for Large-Size AMOLED Display[J].Advanced Display,2009,20(5):20-25. |
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| Authors: | Hye Dong Kim Jae Kyeong Jeong Hyun-Joong Chung Yeon-Gon Mo |
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| Affiliation: | Hye Dong Kim, Jae Kyeong Jeong, Hyun-Joong Chung ,Yeon-Gon Mo (Corporate R＆D center, Samsung SDI Co. LTD,Yongin-City, Kyungki-Do, Korea) |
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| Abstract: | In this work, we review the current technological challenges for large-size AMOLED displays with an emphasis on the backplane technology. Then, it will be discussed how the new technology of oxide TFTs combines the advantages of LTPS and a-Si TFTs to make an optimal solution for large-size backplanes. In particular, we reveal the technological challenges in oxide TFTs by comparing the device characteristics of conventional excimer laser annealing (ELA) LTPS and amorphous indium-gallium-zinc-oxide (a-IGZO) TFTs. Finally, we demonstrate a 12.1＂ WXGA AMOLED prototype display fabricated by an a-IGZO TFT backplane. |
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| Keywords: | crystallization technology low temperature polycrystalline Si (LTPS) amorphous idium gallium-zinc-oxied(a-IGZO) |
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