TaN／TiN和TaWN／TiN多晶超晶格薄膜的微结构与超硬效应

通过磁控反应溅射仪制备了ＴａＮ／ＴｉＮ和ＴＡｗｎ／ＴｉＮ多晶超晶格薄膜。采用Ｘ射线衍射仪。透射电子显微镜和显微硬度仪对超 格薄膜的微结构和硬度进行了分析。

THE MICROSTRUCTURES AND SUPERHARDNESS EFFECT OF THE POLYCRYSTALLICE FaN/TiN AND TaWN/TiN SUPERLATTICE FILMS

The polycrystalline TaN/TiN and TaWN/TiN superlattice films have been grown byreactive magnetron sputtering. The microstructures and microhardness of the superlattice films havebeen studied with X-ray diffraction (XRD), transmission electron microscopy (TEM) and microhardnesstester. The results show that the crystal structure of the component materials in TaN/TiN and TaWN/TiNsuperlattice films are faced-center cubic (FCC) and have a epitaxially grown mode of polycrystallinity. Thecoherent strain has been produced due to the coherent interfaces. TaN/TiN and TaWN/TiN superlatticefilms all have superhardness effect and have hardness maximum values HK=40.0 and 50.0 GPa with amodulation period at 9.0 and 5.6 nm respectively. The authors have proposed that the lattice mismatchaffect the microhardness value and the peak position where hardness gets its maximum. The main reasoncausing hardness anomalies is the inhibition of dislocation motion by alternating stress fields of interfacial coherent strain.