| LED用蓝宝石晶片湿法腐蚀清洗技术的研究 |
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| 引用本文： | 郑佳晶,孙敏,张金凤. LED用蓝宝石晶片湿法腐蚀清洗技术的研究[J]. 电子工业专用设备, 2013, 0(9): 8-10,58 |
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| 作者姓名： | 郑佳晶 孙敏 张金凤 |
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| 作者单位： | 中国电子科技集团公司第四十五研究所,北京101601 |
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| 摘 要： | 介绍了蓝宝石晶片的清洗原理：通过分析蓝宝石的表面净化原理和对湿法腐蚀清洗工艺试验的研究，提出了一种适用于工业化生产蓝宝石晶片的清洗剂和净化工艺，满足了LED领域的蓝宝石晶片表面洁净度要求。
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| 关 键 词： | 蓝宝石晶片 净化工艺 清洗剂 湿法腐蚀 |
Study on Wet Etching Cleaning Technology of Sapphire Wafer for LED |
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| ZHENG Jiajing,SUN Min,ZHANG Jinfeng. Study on Wet Etching Cleaning Technology of Sapphire Wafer for LED[J]. Equipment for Electronic Products Marufacturing, 2013, 0(9): 8-10,58 |
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| Authors: | ZHENG Jiajing SUN Min ZHANG Jinfeng |
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| Affiliation: | (The 45th Research Institute of CETC, Beijing 101601, China) |
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| Abstract: | The cleanliness principle of sapphire wafer is expounded in detail. By analyzing the sapphire surface purification principles and researching wet etching cleaning process. A suitable for industrial production of sapphire wafer cleaning agents and purification process are proposed. It meets the field of LED sapphire wafer surface cleanliness requirements. |
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| Keywords: | Sapphire wafer Purification process Cleaning agents Wet etching |
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