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Highly Flexible MoS(2) Thin-Film Transistors with Ion Gel Dielectrics
Authors:Jiang Pu  Yohei Yomogida  Keng-Ku Liu  Lain-Jong Li  Yoshihiro Iwasa  Taishi Takenobu
Affiliation:Department of Applied Physics, Waseda University , Tokyo 169-8555, Japan.
Abstract:Molybdenum disulfide (MoS(2)) thin-film transistors were fabricated with ion gel gate dielectrics. These thin-film transistors exhibited excellent band transport with a low threshold voltage (<1 V), high mobility (12.5 cm(2)/(V·s)) and a high on/off current ratio (10(5)). Furthermore, the MoS(2) transistors exhibited remarkably high mechanical flexibility, and no degradation in the electrical characteristics was observed when they were significantly bent to a curvature radius of 0.75 mm. The superior electrical performance and excellent pliability of MoS(2) films make them suitable for use in large-area flexible electronics.
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