| 氧离子束辅助沉积氧化铪薄膜光学属性的研究 |
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| 引用本文： | 张大伟,孙浩杰.氧离子束辅助沉积氧化铪薄膜光学属性的研究[J].应用激光,2006,26(5):333-335. |
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| 作者姓名： | 张大伟 孙浩杰 |
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| 作者单位： | 1. 上海理工大学光学与电子工程学院,200093
2. 上海市嘉定区疁城实验学校,201800 |
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| 基金项目： | 上海市重点学科建设项目;上海理工大学校科研和教改项目 |
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| 摘 要： | 电子枪蒸发制备了氧化铪薄膜,对氧离子束辅助和未辅助两种情况下的样品进行了折射率、吸收、激光损伤阈值等属性的测试,结果表明,氧离子束辅助沉积的样品与未辅助沉积的样品相比具有高的折射率和高的吸收,以及稍低的激光损伤阈值。经过分析发现,薄膜的激光损伤阈值是影响薄膜抗激光特性的不利因素和有利因素竞争的结果,离子束辅助沉积技术在引入结构致密等有利因素的同时,也引入了吸收增加等不利因素。
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| 关 键 词： | 离子束辅助沉积 氧化铪 激光损伤阈值 微弱吸收 |
| 收稿时间： | 2006/5/7 |
| 修稿时间： | 2006年5月7日 |
Investigation of laser induce damage threshold of HfO2 films prepared with oxygen ion beam assisted deposition |
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| Zhang Dawei,Lv weige,Shao Jianda,Fan Zhengxiu.Investigation of laser induce damage threshold of HfO2 films prepared with oxygen ion beam assisted deposition[J].Applied Laser,2006,26(5):333-335. |
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| Authors: | Zhang Dawei Lv weige Shao Jianda Fan Zhengxiu |
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| Affiliation: | Zhang Dawei~1,Lv weige~1,Shao Jianda~2,Fan Zhengxiu~2 |
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| Abstract: | Using e-beam evaporation,HfO_2 films were prepared.The characteristics of refractive index,weak absorption,laser-induce damage threshold were measured.It was showed that HfO_2 film prepared with ion beam assisted deposition has higher refractive index,higher absorption,and lower laser-induce damage threshold.Through the analysis,it was pointed that the disadvantages and advantages were introduced by IBAD at the same time and laser-induce damage threshold of films were the results of disadvantages and advantages competition. |
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| Keywords: | ion beam assisted HfO_2 Laser-induce damage threshold weak absorption |
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