Effect of magnetic fields on pulse plating of cobalt films |
| |
Authors: | Yundan Yu Wei Li Junwei Lou Hongliang Ge Lixia Sun Li Jiang Guoying Wei |
| |
Affiliation: | College of Material Science and Engineering, China Jiliang University, Hangzhou 310018, China |
| |
Abstract: | Magnetic fields parallel to the electrodes were introduced during a pulse plating process to obtain cobalt thin films from
alkaline baths. Effects of different magnetic intensities on the composition, microstructure, and magnetic properties of cobalt
thin films were investigated. It was found that the deposition speed increased gradually with the increase of magnetic intensity.
Almost all of the deposited films were crystalline and showed Co(002), Co(100) peaks. With the rise on the magnetic intensity,
the intensity of Co (002) peak raised gradually. Magnetic fields would induce cobalt growing along (002) orientation. The
films were densely covered with typical nodular structure. Films of smaller grain size and smooth surface could be formed
under high magnetic intensity (1 T) as a result of magnetic force and MHD effects. Moreover, higher magnetic intensity induced
larger saturation magnetization and lower coercivity. With the rise on magnetic intensity, cobalt contents in the films increased
gradually, which led to the rise of saturation magnetization. |
| |
Keywords: | pulse plating magnetic field magnetization cobalt thin films |
本文献已被 CNKI 维普 万方数据 SpringerLink 等数据库收录! |
|