Photoelectric Cooperative Induced Wetting on Aligned‐Nanopore Arrays for Liquid Reprography

Surface wettability as a response to the cooperation of different stimuli has been intensively studied and provides more advantages than as a response to a single stimulus. Recently, we demonstrated the patterned wettability transition from the Cassie to the Wenzel state on a superhydrophobic aligned‐ZnO‐nanorod array surface via a photoelectric cooperative wetting process. However, the specific aligned‐nanorod array structure of such devices is easily damaged due to their low mechanical strength and cannot sustain multiple transfer printing. Meanwhile, the patterned wetting process is not easily controlled due to the air‐permeable structure of adjacent nanorods. As a result, in practice, it is difficult to apply liquid reprography on such a nanostructure. Here, we demonstrate photoelectric cooperative induced patterned wetting on the superhydrophobic aligned‐nanopore array surface of TiO₂‐coated nanoporous AAO film, which has a high mechanical strength and excellent controllability. Liquid reprography is achieved through the patterned wetting process on the superhydrophobic aligned‐nanopore array surface, which is a new progression in liquid reprography, and is promising for gearing up the application of photoelectric cooperative liquid reprography.