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Synthesis of few-layer graphene via microwave plasma-enhanced chemical vapour deposition
Authors:Malesevic Alexander  Vitchev Roumen  Schouteden Koen  Volodin Alexander  Zhang Liang  Tendeloo Gustaaf Van  Vanhulsel Annick  Haesendonck Chris Van
Affiliation:VITO Materials, Flemish Institute for Technological Research, Boeretang 200, BE-2400 Mol, Belgium. Laboratory of Solid-State Physics and Magnetism, Katholieke Universiteit Leuven, Celestijnenlaan 200 D, BE-3001 Leuven, Belgium.
Abstract:If graphene is ever going to live up to the promises of future nanoelectronic devices, an easy and cheap route for mass production is an essential requirement. A way to extend the capabilities of plasma-enhanced chemical vapour deposition to the synthesis of freestanding few-layer graphene is presented. Micrometre-wide flakes consisting of four to six atomic layers of stacked graphene sheets have been synthesized by controlled recombination of carbon radicals in a microwave plasma. A simple and highly reproducible technique is essential, since the resulting flakes can be synthesized without the need for a catalyst on the surface of any substrate that withstands elevated temperatures up to 700?°C. A thorough structural analysis of the flakes is performed with electron microscopy, x-ray diffraction, Raman spectroscopy and scanning tunnelling microscopy. The resulting graphene flakes are aligned vertically to the substrate surface and grow according to a three-step process, as revealed by the combined analysis of electron microscopy and x-ray photoelectron spectroscopy.
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