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Investigation of MBE grown GaAs/AlGaAs/InGaAs heterostructures
Authors:R Melkadze  N Khuchua  Z Tchakhnakia  T Makalatia  G D Didebashvili  G Peradze  T Khelashvili  M Ksaverieva
Affiliation:

RPC Electron Technology, Tbilisi State University, Chavchavadze Ave. 13, 380079 Tbilisi, Georgia

Abstract:This paper reports on the influence of the In mole fraction variation (0.1≤x≤0.25) of MBE grown pseudomorphic GaAs/AlyGa1?yAs/InxGa1?xAs heterostructures on the material quality and the performance of the fabricated devices. For x=0.1–0.15, the carrier mobility in the samples was 4500 cm2 V?1 s (at 300 K) and 37 000 cm2V?1 s (at 77 K) and decreased significantly at low temperatures as x was increasing up to 0.25. Transistors with gate length of 0.8 m and In0.1Ga0.9As channels exhibited transconductances of 200–220 mSm mm?1 and output conductances of 0.15–0.20 mSm mm?1, while gate-source breakdown voltages were 27–28 V. Delay times of the designed and fabricated ICs frequency dividers by 2 were 130–140 ps.
Keywords:Molecular beam epitaxy  Field-effect transistor  Pseudomorphic heterostructure
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