首页 | 本学科首页   官方微博 | 高级检索  
     

Design and Manufacture of GeSi/Si Superlattice Nanocrystalline Photodetector
作者姓名:LIU  Shu-ping  JIA  Yue-hu
作者单位:Taiyuan University of Science and Technology, Taiyuan 030024, CHN
基金项目:Education Foundation of Shanxi Province(200341)
摘    要:According to Maxwell's theory, the optical transmission characteristics in GeSi/Si superlattice nanocrystalline layer have been analyzed and calculated. The calculated result shows that when the total thickness L is 340 nm, the single mode lightwave can be transmitted only at periodic number M≥15.5. In addition, at the direction of transmission, when the transmission distance is larger than 500 μm, the lightwave intensity is decreased greatly. Based on the above parameters, the design and manufacture of GeSi/Si superlattice nanocrystalline photodetector are carried out.

关 键 词:GeSi/Si  超晶格  纳米晶体  光电探测器  光学性质
文章编号:1007-0206(2006)01-0021-04
收稿时间:2005-08-05
修稿时间:2005-08-25

Design and Manufacture of GeSi/Si Superlattice Nanocrystalline Photodetector
LIU Shu-ping JIA Yue-hu.Design and Manufacture of GeSi/Si Superlattice Nanocrystalline Photodetector[J].Semiconductor Photonics and Technology,2006,12(1):21-24.
Authors:LIU Shu-ping  JIA Yue-hu
Abstract:According to Maxwell's theory, the optical transmission characteristics in GeSi/Si superlattice nanocrystalline layer have been analyzed and calculated. The calculated result shows that when the total thickness L is 340nm, the single mode lightwave can be transmitted only at periodic number M≥15.5. In addition, at the direction of transmission, when the transmission distance is larger than 500μm, the lightwave intensity is decreased greatly. Based on the above parameters, the design and manufacture of GeSi/Si superlattice nanocrystalline photodetector are carried out.
Keywords:GeSi/Si  Superlattice nanocrystalline  Photodetector
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号