Determination of bulk and interface density of states in polycrystalline silicon thin film transistors

The aim of our investigation is to determine the bulk and interface density of states in excimer laser annealed polycrystalline silicon thin film transistors (polysilicon TFTs). The exponential energy distribution of the band tail states in the bulk of the polysilicon layer is obtained from analysis of the space charge limited current in n⁺-i-n⁺ structures. The density of traps at the gate oxide/polysilicon interface and the slope of the exponential band tail states in a thin layer adjacent to the channel/gate oxide interface are extracted from low-frequency noise measurements. The experimental results indicate that the degree of disorder is improved in the upper part of the polysilicon layer due to its columnar growth.