National Institute of Advanced Industrial, Science and Technology, Tsukuba, Japan. ph.xiang@aist.go.jp
Abstract:
A prototype Mott transistor, the electric double layer transistor with a strained CaMnO(3) thin film, is fabricated. As predicted by the strain phase diagram of electron-doped manganite films, the device with the compressively strained CaMnO(3) exhibits an immense conductivity modulation upon applying a tiny gate voltage of 2 V.