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Patterning of polymer nanocomposite resists containing metal nanoparticles by electron beam lithography
Authors:Lee Byoung-Min  Kang Dong-Woo  Jung Chan-Hee  Choi Jae-Hak  Hwang In-Tae  Hong Sung-Kwon  Lee Jae-Suk
Affiliation:Department of Polymer Science and Engineering, Chungnam National University, Yuseong-gu, Daejeon 305-701, Republic of Korea.
Abstract:Poly(vinyl pyrrolidone) (PVP)-stabilized silver nanoparticles (NPs) were used as a new nanocomposite resist for electron beam lithography. A nanocomposite resist prepared by reducing silver nitrate in an alcoholic PVP solution was patterned by using a scanning electron microscope equipped with a nanometer pattern generation system. Well-defined negative tone patterns with a good sensitivity of 200 microC/cm2 and a contrast of 2.83 were obtained using the prepared nanocomposite resist. In addition, the changes in the morphology and structure of the resist patterns with a thermal treatment temperature were investigated by a FE-SEM with an EDX. The results revealed that the patterns of Ag NPs were formed through sintering the formed resist patterns at above 300 degrees C.
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