Investigation of Glasses Using Surface Profiling by Spectrochemical Analysis of Sputter-Induced Radiation: I, Surface Profiling Technique with High In-Depth Resolution |
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Authors: | HANS BACH FRIEDRICH G K BAUCKE |
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Affiliation: | Zentralbereich Forschung und Entwicklung der Schott Glaswerke, Hattenbergstrasse 10, 6500 Mainz, Federal Republic of Germany |
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Abstract: | Experimental equipment was developed to investigate concentration gradients in solid surface layers; the radiative de-excitation of elements and molecules which are ejected from the ion beam-bombarded solid and the luminescence excitation within the surface layer are recorded spectrographically. Examples show how elemental composition profiles can be calibrated with respect to depth. An in-depth resolution of a few nanometers can be obtained. The original profiles are distorted by energy and charge transfer and by other peculiarities connected with ion-beam etching; the extent to which these distortions must be taken into consideration in interpreting the results is discussed. Interdiffusion-controlled solid-state reactions of thin oxide films with a glass substrate were investigated. Advantages and disadvantages of the method for analysis and concentration profiling of glass surfaces and oxide layers on glasses in glass research and industry are discussed. |
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