|
|||||
|
|
Selective Formation of Inverted Opals by Electron‐Beam Lithography |
|
| Authors: | B&#x;H Jurez D Golmayo P&#x;A Postigo C Lpez |
| Affiliation: | B.?H. Juárez,D. Golmayo,P.?A. Postigo,C. López |
| Abstract: | |
| Keywords: | Chemical vapor deposition (CVD) atmospheric pressure Composites Lithography electron‐beam Photonic crystals colloidal Poly(methyl methacrylate) (PMMA) |