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Edge-emitting electroluminescence polarization investigation of InGaN/GaN light-emitting diodes grown by metal-organic chemical vapor deposition on sapphire (0001)
Authors:D I Florescu  D S Lee  S M Ting  J C Ramer  E A Armour
Affiliation:(1) EMCORE Corporation, 08873 Somerset, NJ
Abstract:The edge-emitting electroluminescence (FL) state of polarization of blue and green InGaN/GaN light-emitting diodes (LEDs) grown in EMCORE’s commercial reactors was studied and compared to theoretical evaluations. Blue (∼475 nm) LEDs exhibit strong EL polarization, up to a 3:1 distinction ratio. Green (∼530 nm) LEDs exhibit smaller ratios of about 1.5:1. Theoretical evaluations for similar InGaN/GaN superlattices predicted a 3:1 ratio between light polarized perpendicular (E⊥c) and light polarized parallel (E‖c) to the c axis. For the blue LEDs, a quantum well-like behavior is suggested because the E⊥c mode dominates the E‖c mode 3:1. In contrast, for the green LEDs, a mixed quantum well (QW)-quantum dot (QD) behavior is proposed, as the ratio of E⊥c to E‖c modes drops to 1.5:1. The EL polarization fringes were also observed, and their occurrence may be attributed to a symmetric waveguide-like behavior of the InGaN/GaN LED structure. A large 40%/50% drop in the surface root mean square (RMS) from atomic force microscopy (AFM) scans on blue/green LEDs with and without EL fringes points out that better surfaces were achieved for the samples exhibiting fringing. At the same time, a 25%/10% increase in the blue/green LED photoluminescence (PL) intensity signal was found for samples displaying EL interference fringes, indicating superior material quality and improved LED structures.
Keywords:Metal-organic chemical vapor deposition (MOCVD)  GaN  InGaN  light-emitting diode (LED)  multiple quantum well (MQW)  atomic force microscopy (AFM)  photoluminescence (PL)  quantum dot (QD)  quantum well (QW)
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