显影单元腔室内流场结构分析与优化

匀胶显影设备中温湿度控制器（THS）为单元提供温度和湿度适宜的洁净空气，为保证单元内产生的颗粒不污染晶片，在单元中将空气流动设计成DownFlow形式，这样能带走单元腔室中的灰尘颗粒，有利于防止晶片的颗粒污染。由于显影单元的内部结构复杂，无法直接测量单元内部实际工作条件下的气流状态。文中采用数值模拟分析的方法对显影单元内部进行流场仿真分析，根据分析结果对结构进行优化，以达到更理想的腔室内气体流动状态，可以节约修改结构和复杂测试所消耗的时间和成本，缩短设计周期。

Analysis and Optimization of the Inner Flow Field Structure in the Developer Unit

The temperature-humidity controller （THS） of Spin Coating ＆ Developing Device provides clean air with suitable and stable temperature and humidity for units. The flow field in unit is designed to Down Flow to take away particles and ensuring no particle contamination on wafers. Because of the complicated internal structure, the working status of air-flow distribution inside the unit can＇t be measured directly, a computational fluid dynamics method is used to study the flow distribution inside the unit. The structure is optimized to achieve better air flow state, save the test time anti cost, thus shorten the design cycle.