| Mo原子溅射能量对Mo/Si薄膜微结构的影响 |
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| 引用本文： | 秦俊岭,易葵,邵建达. Mo原子溅射能量对Mo/Si薄膜微结构的影响[J]. 功能材料与器件学报, 2006, 12(2): 81-85 |
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| 作者姓名： | 秦俊岭 易葵 邵建达 |
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| 作者单位： | 1. 中国科学院上海光学精密机械研究所,上海,201800;中国科学院研究生院,北京,100039
2. 中国科学院上海光学精密机械研究所,上海,201800 |
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| 基金项目： | 教育部"同步辐射博士生创新中心"研究生创新基金 |
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| 摘 要： | 用磁控溅射法制备了Mo/Si薄膜,用AFM和XRD分别研究了Mo原子的溅射能量不同时,Mo/Si薄膜表面形貌和晶相的变化.通过比较发现,随着Mo原子溅射能量的增大,Mo/Si薄膜表面粗糙度增加,Mo和Si的特征X射线衍射峰也越来越强,并且Mo膜层和Si膜层之间生成了MoSi2.Mo原子的溅射能量是诱导非晶Si结晶和MoSi2生成的主要原因.
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| 关 键 词： | Mo/Si MoSi2 溅射能量 |
| 文章编号： | 1007-4252（2006）02-0081-05 |
| 收稿时间： | 2005-05-31 |
| 修稿时间： | 2005-07-11 |
Influence of sputtering energy of Mo atoms on microstructure of Mo/Si thin film |
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| QIN Jun-ling,YI Kui,SHAO Jian-da. Influence of sputtering energy of Mo atoms on microstructure of Mo/Si thin film[J]. Journal of Functional Materials and Devices, 2006, 12(2): 81-85 |
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| Authors: | QIN Jun-ling YI Kui SHAO Jian-da |
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| Affiliation: | 1. Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800,China;2. Graduate School of The Chinese Academy of Sciences, Beijing 100039,China |
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| Abstract: | Mo/Si bilayer thin films were prepared by sputtering Mo onto amorphous Si film grown on Si Mo/Si film is increasing, characteristic diffraction peaks of Mo and Si species beome stronger and stronger, furthermore, the peak of MoSi2 which may be formed between Mo layer and Si layer appears. Sputtering energy of Mo atoms is attributed to be the main cause for crystallization of amorphous Si and formation of MoSi2. |
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| Keywords: | Mo/Si MoSi2 sputtering energy |
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