| 非平衡磁控溅射掺Cr类石墨镀层的结构分析 |
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| 引用本文： | 严少平,;蒋百灵,;张永宏,;陈迪春,;李洪涛. 非平衡磁控溅射掺Cr类石墨镀层的结构分析[J]. 淮南工业学院学报, 2009, 0(4): 71-76 |
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| 作者姓名： | 严少平, 蒋百灵, 张永宏, 陈迪春, 李洪涛 |
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| 作者单位： | [1]安徽理工大学理学院,安徽淮南232001; [2]西安理工大学材料科学与工程学院,陕西西安710048 |
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| 基金项目： | 安徽省教育厅自然科学基金资助项目（2005kj034zd）;国家863科技攻关项目（2005AA33H010） |
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| 摘 要： | 采用非平衡磁控溅射离子镀技术，通过调节Cr靶的溅射功率。在单晶硅基片上沉积制备了一系列不同Cr含量的类石墨（Cr—GLC）镀层样品。利用Raman光谱仪、X射线光电子能谱（XPS）、透射电子电镜（TEM）、显微硬度计分析了Cr—GLC的微观结构和显微硬度。结果表明，利用非平衡磁控溅射得到的Cr—GLC镀层，随Cr含量的增高，硬度逐渐降低并趋于稳定。当Cr含量小于4％时，Cr只以单质非晶态分布于非晶GLC中，Cr的掺杂降低了内应力；当Cr含量超过49／6后，还有CrC。纳米晶存在于非晶态的GLC中；镀层由C、Cr和CrC。纳米晶粒组成非晶纯构，
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| 关 键 词： | 类石墨镀层 微观结构 显微硬度 |
Analysis of Structure of Cr-doped GLC Coatings Deposited by Unbalanced Magnetron Sputtering |
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| Affiliation: | YAN Shao-ping,JIANG Bai-ling,ZHANG Yong-hong, CHEN Di-chun, LI Hong-tao (1. Department of Physics, Anhui Uiversity of Science and Technology, Huainan Anhui 232001, China; 2. School of Ma terials Science and Engineering, Xi＇an University of Technology, Xi＇an Shanxi 710048, China) |
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| Abstract: | A series of samples with different Cr concentration of Cr-doped GLC coatings deposited on single crystal silicon substrates by unbalanced magnetron sputtering ion plating technique were prepared by adjusting sputtering power of Chromium target. Microstructure of Cr-GLC coatings was investigated by Raman spectrum, X-ray photoelectron spectrometer （XPS）, transmission electronic microscope （TEM）, and microhardness was measured by microhardness tester. The results showed that hardness of Cr-GLC coatings gradually decreases with increase of Cr content and tends to a stable value. Chromium noncrystals occur in amorphous GLC coatings when Cr content is below 4%, and chromium doping results in inner stress decrease. CrCxnanocrystals also occur in amorphous GLC coatings when Cr content is above 4%. The amorphous coatings are composed of C, Cr and CrCxnanocrystals. |
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| Keywords: | Cr-doped GLC coating rnicrostructure microhardness |
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