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用光电化学的方法研究模拟混凝土孔溶液中缓蚀剂对钢筋钝化膜的影响
引用本文:汪鹰,史苑芗,魏宝明,扬勇,陈旭光,储炜,林祖赓. 用光电化学的方法研究模拟混凝土孔溶液中缓蚀剂对钢筋钝化膜的影响[J]. 腐蚀科学与防护技术, 1998, 10(4): 2-6
作者姓名:汪鹰  史苑芗  魏宝明  扬勇  陈旭光  储炜  林祖赓
作者单位:南京化工大学应用化学系,厦门大学化学系
基金项目:厦门大学国家表面物理化学重点实验室资助,江苏省自然科学基金
摘    要:采用光电化学的方法研究了复合缓蚀剂对钢筋钝化膜的影响.结果表明复合缓蚀剂的加入没有改变钢筋钝化膜的晶体结构和电子性质,它仍然是无定形n型的半导体成相膜,但对抑制点蚀核的形成有明显作用,且对钝化膜的生长速度有加快作用,从而有可能使钝化膜的组成发生改变.

关 键 词:光电化学  复合缓蚀剂  钢筋钝化膜  点蚀核  生长速度
收稿时间:1998-07-25
修稿时间:1998-07-25

STUDY ON THE EFFECT OF INHIBITORS ON PASSIVE FILM OF REBAR BY PHOTOELECTROCHEMICAL METHOD
WANG Ying,SHI Yuanxiang,WEI Baoming. STUDY ON THE EFFECT OF INHIBITORS ON PASSIVE FILM OF REBAR BY PHOTOELECTROCHEMICAL METHOD[J]. Corrosion Science and Protection Technology, 1998, 10(4): 2-6
Authors:WANG Ying  SHI Yuanxiang  WEI Baoming
Abstract:An in situ photoelectrochemical study was made to compare passive films on rebar formed in simulated concrete pore solution with or without inhibitors. The results indicated that the crystal structure and electron property of passive film were not changed due to adding composite inhibitors. It was still a n type amorphous semiconductive film. But pitting nucleus initiation was inhibited obviously and the growth rate of passive film was increased by adding inhibitors so that the composition of the film might be changed.
Keywords:photoelectrochemistry   composite inhibitors   pitting nucleus   rebar passive film   growth rate  
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