首页 | 本学科首页   官方微博 | 高级检索  
     

Effect of Methane Flow Rate on Growth and Properties of TiSi-C:H Films Deposited by Middle-frequency Magnetron Sputtering
作者姓名:姜金龙  陈 娣  王 琼  黄 浩  朱维君  郝俊英
作者单位:兰州理工大学,甘肃 兰州 730050,兰州理工大学,甘肃 兰州 730050,兰州理工大学,甘肃 兰州 730050,兰州理工大学,甘肃 兰州 730050,兰州理工大学,甘肃 兰州 730050,中国科学研究院兰州化学物理研究所 固体润滑国家重点实验室, 甘肃 兰州 730000
基金项目:National Natural Science Foundation of China(51105186);Natural Science Foundation of Gansu Province(1014RJZA007);Excellent Young Teachers Program of Lanzhou University of Technology(1010ZCX010);the Doctoral Research Grant of Lanzhou University of Technology
摘    要:以甲烷为先驱气体通过中频磁控溅射Ti80Si20靶材在硅和不锈钢基底上制备TiSi-C:H薄膜,研究了甲烷流量对薄膜沉积速率、结构、力学和摩擦学性能的影响。结果表明,甲烷流量对薄膜结构、力学和摩擦学性能有显著影响,随甲烷流量增加薄膜从包含约10 nm晶的锥状纳米晶/非晶复合结构向非晶结构转变,在低甲烷流量下沉积的薄膜具有高硬度、高应力和高磨损率;在高甲烷流量下薄膜硬度和应力降低,而摩擦学性能提高。薄膜力学和摩擦学性能的变化被认为是随甲烷流量增加薄膜结构演化的结果。

关 键 词:a-C:H薄膜  中频磁控溅射  力学性能  摩擦性能
收稿时间:2013/11/14 0:00:00

Effect of Methane Flow Rate on Growth and Properties of TiSi-C:H Films Deposited by Middle-frequency Magnetron Sputtering
Jiang Jinlong,Chen Di,Wang Qiong,Huang Hao,Zhu Weijun and Hao Junying.Effect of Methane Flow Rate on Growth and Properties of TiSi-C:H Films Deposited by Middle-frequency Magnetron Sputtering[J].Rare Metal Materials and Engineering,2014,43(10):2305-2310.
Authors:Jiang Jinlong  Chen Di  Wang Qiong  Huang Hao  Zhu Weijun and Hao Junying
Affiliation:Lanzhou University of Technology, Lanzhou 730050, China,Lanzhou University of Technology, Lanzhou 730050, China,Lanzhou University of Technology, Lanzhou 730050, China,Lanzhou University of Technology, Lanzhou 730050, China,Lanzhou University of Technology, Lanzhou 730050, China and Lanzhou University of Technology, Lanzhou 730050, China
Abstract:The TiSi-C:H films were deposited on the silicon and the stainless steel substrates by middle-frequency magnetron sputtering Ti80Si20 targets using the methane gas as the precursor. The effects of the methane flow rate on the deposition rate, the structure, the mechanical and tribological properties were investigated. The results demonstrate that the structure, the mechanical and tribological properties of the films strongly depend on the methane flow rate. The deposited films exhibit a transition from a tapered columnar nanocomposite structure consisting of ~10 nm nanocrystallites and amorphous phases to an amorphous structure with increasing of methane flow rate. The films deposited at a low methane flow rate show high hardness, high internal stress and high wear rates, whereas the films deposited at high methane flow rate show a decrease in hardness and internal stress but an improvement in tribological performance. The variations on the mechanical and tribological properties may be attributed to the evolution of the microstructures of the films with increasing of methane flow rate.
Keywords:a-C:H films  middle-frequency magnetron sputtering  mechanical property  tribological property
本文献已被 CNKI 等数据库收录!
点击此处可从《稀有金属材料与工程》浏览原始摘要信息
点击此处可从《稀有金属材料与工程》下载全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号