| 基于USB2.0与CPLD的光刻机底面对准系统设计 |
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| 引用本文： | 邓玖根,张正荣,胡松,唐小萍,马平.基于USB2.0与CPLD的光刻机底面对准系统设计[J].微纳电子技术,2007,44(12):1082-1086. |
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| 作者姓名： | 邓玖根 张正荣 胡松 唐小萍 马平 |
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| 作者单位： | 1. 中国科学院,光电技术研究所,成都,610209;中国科学院,研究生院,北京,100039
2. 中国科学院,光电技术研究所,成都,610209 |
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| 摘 要： | 介绍了光刻机底面对准系统的基本原理,并分析了传统底面对准系统存在的缺点,给出了基于USB2.0与CPLD的光刻机底面对准新系统的设计方案。论述了系统硬件和软件的实现,并对其中的关键模块进行了深入分析。与传统底面对准系统相比,该对准系统成本降低约70%,同时,系统的可靠性大幅提高。实验表明,该系统的底面对准精度达到0.25μm,满足系统设计要求。
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| 关 键 词： | 光刻机 底面对准 USB2.0 复杂可编程逻辑器件 |
| 文章编号： | 1671-4776(2007)12-1082-05 |
| 修稿时间： | 2007年5月8日 |
Design of Lithography-Equipment Bottom Side Alignment System Based on USB2.0 and CPLD |
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| Deng Jiugen,Zhang Zhengrong,Hu Song,Tang Xiaoping,Ma ping.Design of Lithography-Equipment Bottom Side Alignment System Based on USB2.0 and CPLD[J].Micronanoelectronic Technology,2007,44(12):1082-1086. |
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| Authors: | Deng Jiugen Zhang Zhengrong Hu Song Tang Xiaoping Ma ping |
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| Abstract: | The fundamental principle of lithography equipment bottom side alignment(BSA) system was introduced.An analysis of traditional BSA system disadvantages was made,followed by the design of new BSA system based of USB2.0 and CPLD presented.The realization of the system software and hardware was presented,with an in-depth analysis of the key modules of the system.Compared with the traditional BSA system,the cost of the new system reduces by 70%,and the reliability improves greatly.The experimental results show that the BSA precision of the system achieves 0.25 μm,satisfying the practical requirement. |
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| Keywords: | USB2 0 |
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