Formation and control of defects during molecular beam epitaxial growth of HgCdTe

Void defects were demonstrated to form away from the substrate-epifilm interface during the molecular beam epitaxial growth of mercury cadmium telluride on cadmium zinc telluride substrates. These were smaller in size compared to voids which nucleated at the substrate-epifilm interface, which were also observed. Observations of void nucleation away from the substrate-epifilm interface were related to the respective growth regimes active at the time of the void nucleation. Once nucleated, voids replicated all the way to the surface even if the flux ratios were modified to prevent additional nucleation of voids. For a significant number of films, void defects were observed co-located with hillocks. These voids were usually smaller than 1 μm and appeared almost indistinguishable from unaccompanied simple voids. However, these void-hillock complexes displayed a nest of dislocation etch pits around these defects upon dislocation etching, whereas unaccompanied voids did not. The nests could extend as much as 25 μm from the individual void-hillock complex. The density of dislocations within the nest exceeded 5×10⁶ cm⁻², whereas the dislocation density outside of the nest could decrease to <2×10⁵ cm⁻². The void-hillock complexes formed due to fluctuations in growth parameters. Elimination of these fluctuations drastically decreased the concentrations of these defects.