Electrochemical etching of AA5083 aluminium alloy in trihexyl(tetradecyl)phosphonium bis(trifluoromethylsulfonyl)amide ionic liquid |
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| Affiliation: | 1. Department of Mechanical Engineering, Faculty of Engineering, Bu-Ali Sina University, Hamedan 65178, Iran;2. School of Metallurgical and Materials Engineering, College of Engineering, University of Tehran, Tehran, Iran;1. Kalaignar Karunanidhi Institute of Technology, Coimbatore. Tamilnadu, 641402, India;2. Karpagam University. Coimbatore, Tamilnadu, 641021, India;1. Department of Materials Engineering, Indian Institute of Science, Bangalore 560012, India;2. Advanced Materials and Manufacturing Processes Institute and Department of Materials Science and Engineering, University of North Texas, Denton, TX 76203-5017, USA;1. School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240, PR China;2. Shanghai Key Laboratory of Materials Laser Processing and Modification, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240, PR China |
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| Abstract: | Trihexyl(tetradecyl)phosphonium bis(trifluoromethylsulfonyl)amide ([P6,6,6,14][NTf2]) ionic liquid is shown to react with AA5083 aluminium alloy under a two-step anodic polarisation, leading to partial passivation of the surface. Surface characterisation established that an electrochemical etching process had occurred, comparable to acid etching of aluminium. Energy dispersive X-ray spectroscopy (EDXS) and X-ray photoelectron spectroscopy (XPS) results indicated that magnesium de-alloyed from Mg2Si intermetallic particles and metal fluorides were deposited onto the remaining Mg2Si sites, leading to a decrease in the anodic corrosion kinetics (to one third of that of the control) as well as a 100 mV vs. SCE increase in the corrosion and pitting potentials. |
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| Keywords: | A. Aluminium A. Molten salts B. Polarisation B. SEM B. XPS C. Anodic protection |
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