Study on enhancement of diamond nucleation on fused silica substrate by ultrasonic pretreatment |
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| Affiliation: | 1. Faculty of Engineering, China University of Geosciences, Wuhan, Hubei 430074, PR China;2. Department of Civil & Architectural Engineering, Liaoning University of Technology, Jinzhou, Liaoning 121001, PR China;2. INFN-TIFPA, Trento, Italy;1. Graduate School of Integrated Arts and Sciences, Hiroshima University, 1-7-1 Kagamiyama, Higashi-Hiroshima 739-8521, Japan;2. X-ray Instrument Division, Rigaku Corporation, 14-8 Akaoji, Takatsuki, Osaka 569-1146, Japan;3. Institute of Materials and Systems for Sustainability, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan;4. Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan;5. Institute for Materials Research, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai 980-8577, Japan;1. Department of Mechanical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, Saskatchewan S7N 5A9, Canada;2. Canadian Light Source, 44 Innovation Boulevard, Saskatoon, Saskatchewan S7N 2V3, Canada |
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| Abstract: | Fused silica substrates were pretreated by the ultrasonic vibration in the diamond powder slurry (UVDS). The influence of UVDS parameters such as the grain size of diamond powder, the liquid medium used to form the slurry, the weight ratio of diamond powder to liquid medium and the pretreatment time on the diamond nucleation density (DND) were systemically investigated. The grain size of diamond powder greatly affected the DND, the larger the grain size the higher the DND in our experiment conditions. The DND was about the same using acetone or ethanol or hexane medium. The best weight ratio of diamond powder (grain size 20–40 μm) to liquid medium was ∼1/60. Under appropriate pretreatment and CVD conditions, the DND of ∼1010 cm−2 was obtained on fused silica substrates. Continuous ultra-thin diamond films with uniform and smooth surface (diamond grain size: ∼150 nm and surface roughness: ∼6 nm) were synthesized in an improved hot filament chemical vapor deposition (HFCVD) system. Nano-damaged sites on the pretreated surface mainly enhanced the DND and shortened the incubation time of nucleation. |
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