影响化学气相沉积多晶硅致密料比例的因素

改良西门子法生产多晶硅还原工艺是高纯的三氯氢硅和氢气在还原炉内发生化学气相沉积反应,得到固态多晶硅,多晶硅根据表观质量,分为致密料、玉米料、珊瑚料。目前,国内多晶硅生产以大型还原炉为主,对成本控制具有明显优势,但存在的问题是多晶硅致密料比例较低。本文通过对还原炉反应温度控制、进料喷嘴布置、反应配比等因素的分析研究,得出了提高还原炉化学气相沉积多晶硅致密料比例的方法、思路。

Factors affecting the proportion ratio of chemical vapor deposition polysilicon

The improved Siemens method produces polysilicon reduction process is high purity Trichlorosilane and hydrogen in the reducing furnace chemical vapor deposition reaction, obtained solid polysilicon, polysilicon according to the apparent quality, divided into incur, yumiliao, coral material.At present, domestic polysilicon production is dominated by large reducing furnace, which has obvious advantages in cost control, but the problem is the low proportion of polysilicon caused by polysilicon.In this paper, through the analysis of the factors of temperature control, feed nozzle layout and reaction ratio, the method and idea of improving the proportion of polysilicon caused by reduction furnace chemical vapor deposition were obtained.