X射线辐照下材料电子发射特性的模拟

稳态 X 射线管是一种重要的 X 射线辐照模拟装置，在辐照效应等研究领域有重要应用。采用蒙特卡罗模拟方法计算了 50 kV,150 kV 和 225 kV 管电压下的 X 射线能谱，并对 X 射线辐照下电子发射进行了模拟；研究了准直孔直径分别为 2 mm,4 mm 和 6 mm 条件下 X 射线的焦斑分布和电子发射弥散情况，以及不同能谱的 X 射线轰击到聚乙烯、聚酰亚胺、Si、SiO₂、Cu、Ta 和 W等样品上产生的电子发射能谱和电流强度等特性，为 X 射线辐照下材料电子发射特性的实验研究和设计提供一定的理论基础和指导。

Simulation of electron emission characteristics of materials induced by X-ray irradiation

Steady-state X-ray source is an important radiation simulation device, which has important applications in research fields such as radiation effects. Electron emission occurs when X-ray bombards the target. Long-term bombarding will cause the accumulation of charge on the surface of the material or the effect of electron multiplication, which will lead to the change of material properties. The Monte Carlo simulation method is applied to calculate the X-ray energy spectrum at tube voltages of 50 kV, 150 kV and 225 kV, and the electron emission under X-ray irradiation is simulated. The focal spot distribution of X-ray and the dispersion of electron emission with collimating hole diameters of 2 mm, 4 mm and 6 mm are studied respectively, and the characteristics of electron emission energy spectrum and current intensity generated by X-ray bombardment of different energy spectra on samples such as polyethylene, polyimide, Si, SiO₂, Cu, Ta and W are also studied, which can provide theoretical basis and guidance for the experimental research and design of electron emission characteristics of materials under X-ray irradiation.