| RF磁控溅射制备钛酸锶钡BST纳米薄膜 |
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| 引用本文： | 马骏,冯洁,杨春生,丁桂甫. RF磁控溅射制备钛酸锶钡BST纳米薄膜[J]. 压电与声光, 2006, 28(2): 205-208 |
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| 作者姓名： | 马骏 冯洁 杨春生 丁桂甫 |
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| 作者单位： | 上海交通大学,薄膜与微细技术教育部重点实验室,上海,200030 |
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| 基金项目： | 上海市科委基金资助项目，国家自然科学基金资助项目(10377009) |
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| 摘 要： | 钛酸锶钡(BST)薄膜作为一种高K介质材料在微电子和微机电系统等领域具有广阔的应用前景,人们已对BST薄膜的制备工艺技术和介电性能进行了大量的研究。BST纳米薄膜的制备工艺直接影响和决定着薄膜的介电性能(介电常数、漏电流密度、介电强度等)。对RF磁控反应溅射制备BST纳米薄膜的工艺技术进行了综述。从溅射靶的制备、溅射工艺参数的优化、热处理、薄膜组分的控制,及制备工艺对介电性能的影响等方面,对现有研究成果进行了较全面的总结。
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| 关 键 词： | 钛酸锶钡 RF磁控溅射 介电性能 化学计量比 微结构 退火 |
| 文章编号： | 1004-2474(2006)02-0205-04 |
| 收稿时间： | 2004-07-05 |
| 修稿时间： | 2004-07-05 |
Key Problems in the Preparation of (Ba,Sr)TiO3 Thin Films by RF Magnetron Reactive Sputter Deposition |
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| MA Jun,FENG Jie,YANG Chun-sheng,DING Gui-fu. Key Problems in the Preparation of (Ba,Sr)TiO3 Thin Films by RF Magnetron Reactive Sputter Deposition[J]. Piezoelectrics & Acoustooptics, 2006, 28(2): 205-208 |
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| Authors: | MA Jun FENG Jie YANG Chun-sheng DING Gui-fu |
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| Affiliation: | Key Lab. for Thin Film and Microfabrication Technology of Ministry of Education, Shanghai Jiaotong University, Shanghai 200030,China |
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| Abstract: | The processing technology and dielectric properties of(Ba,Sr)TiO_3(BST) thin films have been widely studied because of its promising application as dielectric materials in the fields of microelectronics and microelectromechanical system(MEMS),etc.The processing technology determines the dielectric properties(dielectric constant, leakage current density,dielectric strength,etc.) of BST thin films.This paper make a review in some key problems in the preparation technology of BST thin films by RF magnetron reactive sputtering deposition,such as preparation of BST target,optimization of processing parameter,control of thin films composition,and the effects of processing parameters on dielectric properties,etc. |
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| Keywords: | barium strontium titanate ceramic RF magnetron sputter deposition dielectric properties stoichiometry microstructure postdeposition annealing |
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