Precision of micromilled x-ray masks and exposures |
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Authors: | C Friedrich P Coane J Goettert N Gopinathin |
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Affiliation: | (1) Michigan Technological University (MEEM), Houghton, MI 4993 1, USA, US;(2) Louisiana Tech University (IfM), Ruston, LA 71272, USA, US |
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Abstract: | Micromechanical milling has been shown to be a rapid and direct method for the fabrication of structures with the geometry
and size suitable for use as x-ray mask absorbers. While the micromilling process can not duplicate the size and resolution
of absorber patterns created by high energy electron beam or optical lithography methods, micromilling can repeatedly create
absorber line widths down to 10 micrometers, or less, with a one-sigma tolerance of 0.5 micrometers. A method for easily characterizing
milling tool run out has been adapted so tool change out can be more routine. The milling process leaves some absorber burrs
and the absorber is apparently tapered at the machined wall which introduce process biases, both of which add to exposure
degradation. Nevertheless, based on work to date, it appears both of these effects can be reduced to acceptable limits.
Received: 25 August 1997/Accepted: 3 September 1997 |
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