| 用AZ4620制作微电镀模的工艺研究(英文) |
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| 引用本文： | 王明亮,郑剑铭,孙道恒. 用AZ4620制作微电镀模的工艺研究(英文)[J]. 微纳电子技术, 2004, 41(4): 27-31 |
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| 作者姓名： | 王明亮 郑剑铭 孙道恒 |
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| 作者单位： | 厦门大学机电工程系,福建,厦门,361005 |
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| 基金项目： | SupportedbyFujianNaturalScienceFund(A0110003)，KeyProjectofSciencePlanofFujian(2002H022) |
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| 摘 要： | 介绍了利用AZ4620光刻胶制作截面为5μm×5μm微电镀模的工艺流程,详细说明了工艺流程中影响实验结果的实验参数以及实验参数的优化方法,并用实验结果说明了应该避免的实验误区。最后根据优化后的参数制作出满足课题需要的实验结果。
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| 关 键 词： | 光刻 悬臂梁 微电镀 AZ4620 |
Fabrication process of micro-electroplating molds with AZ4620 |
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| Abstract. Fabrication process of micro-electroplating molds with AZ4620[J]. Micronanoelectronic Technology, 2004, 41(4): 27-31 |
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| Authors: | Abstract |
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| Abstract: | The process for fabricating a micro-electroplating mold for 5 μm wide and 5 μμm high cantilever with AZ4620 is proposed. The parameters to determine the experiment results and the method to optimize those parameters are illuminated in details. Examples of experiments errors that should be avoided are given. At last, the satisfying electroplating molds fabricated with optimized parameters are shown. |
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| Keywords: | photolithography cantilever microelectroplating AZ4620 |
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