| 高纵横比微孔列阵的干刻工艺 |
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| 引用本文： | 卢耀华,李野,端木庆铎,姜德龙,富丽晨,田景全. 高纵横比微孔列阵的干刻工艺[J]. 长春理工大学学报(自然科学版), 1998, 0(4) |
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| 作者姓名： | 卢耀华 李野 端木庆铎 姜德龙 富丽晨 田景全 |
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| 作者单位： | 长春光学精密机械学院 |
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| 摘 要： | 本文简述了干法刻蚀的现状和Ｍｕｌｔｉｐｌｅｘ － ＩＣＰ 的结构原理， 给出了高纵横比微孔列阵的初刻实验结果， 并对有关参数进行了初步讨论
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| 关 键 词： | 微孔列阵 干刻 纵横比 选择比 |
Dry etching Technology for High Aspect of Micro holes Array |
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| Lu Yaohua Li Ye Duanmu Qingduo Jiang Delong Fu Lichen Tian Jingquan. Dry etching Technology for High Aspect of Micro holes Array[J]. Journal of Changchun University of Science and Technology, 1998, 0(4) |
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| Authors: | Lu Yaohua Li Ye Duanmu Qingduo Jiang Delong Fu Lichen Tian Jingquan |
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| Affiliation: | Changchun Institute of Optics and Fine Mechanics |
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| Abstract: | The present status of dry etching the structure and principle of Multiplex ICP were introduced in this paper.The primary experiment results on high aspect radip of the micro hole array were obtained.Finally,we discussed the geometric and processing parameters of the deep hole microchannel array prepared by ICP. |
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| Keywords: | Micro hole array Dry etching Aspect radio Selection radio |
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