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Effect of annealing temperature on the structural-microstructural and electrical characteristics of thallium bearing HTSC films prepared by chemical spray pyrolysis technique
Authors:K K Verma  R S Tiwari  O N Srivastava
Affiliation:(1) Department of Physics and Electronics, Dr R M L Avadh University, 224 001 Faizabad, India;(2) Department of Physics, Banaras Hindu University, 221 005 Varanasi, India
Abstract:In order to get good quality reproducible films of Tl : HTSC system, we have studied the different annealing conditions to finally achieve the optimized annealing condition. In the present investigation, Tl-Ca-Ba-Cu-O superconducting films have been prepared on YSZ (100) and MgO (100) single crystal substrates via precursor route followed by thallination. The post deposition heat treatments of the precursor films were carried out for various annealing temperatures (870°C, 890°C) and durations (1 and 2 min). The optimized thallination procedure occurred at 870°C for 2 min into good quality films withT c (R = 0) ∼ 103 K for YSZ andT c (R = 0) ∼ 98 K for MgO substrates, respectively. Further we have correlated the structural/microstructural characteristics of the films.
Keywords:Tl : HTSC films                      optimized annealing condition                      spray pyrolysis                      precursor route
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