Effect of annealing temperature on the structural-microstructural and electrical characteristics of thallium bearing HTSC films prepared by chemical spray pyrolysis technique |
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Authors: | K K Verma R S Tiwari O N Srivastava |
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Affiliation: | (1) Department of Physics and Electronics, Dr R M L Avadh University, 224 001 Faizabad, India;(2) Department of Physics, Banaras Hindu University, 221 005 Varanasi, India |
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Abstract: | In order to get good quality reproducible films of Tl : HTSC system, we have studied the different annealing conditions to
finally achieve the optimized annealing condition. In the present investigation, Tl-Ca-Ba-Cu-O superconducting films have
been prepared on YSZ (100) and MgO (100) single crystal substrates via precursor route followed by thallination. The post
deposition heat treatments of the precursor films were carried out for various annealing temperatures (870°C, 890°C) and durations
(1 and 2 min). The optimized thallination procedure occurred at 870°C for 2 min into good quality films withT
c (R = 0) ∼ 103 K for YSZ andT
c (R = 0) ∼ 98 K for MgO substrates, respectively. Further we have correlated the structural/microstructural characteristics of
the films. |
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Keywords: | Tl : HTSC films optimized annealing condition spray pyrolysis precursor route |
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