Affiliation: | a The Institute of Scientific and Industrial Research, Osaka University, 8-1, Mihoga-oka, Ibaraki, Osaka 567, Japan b Hitachi Ltd., 4–6, Kanda-surugadai, Chiyoda, Tokyo 101, Japan c Hitachi Naka Seiki Ltd., 1040, Ichige, Katsuta, Ibaraki 312, Japan |
Abstract: | An analytical electron microscope with a field emission electron gun has been developed in order to improve the function of material identification, in order to obtain higher resolution of images, sharper electron diffraction patterns, and purer x-ray spectra with no effects of contamination from smaller areas than in the conventional instruments so far utilized. The performance capabilities of this newly developed analytical electron microscope, the Model H-600FE, have been examined and found to be very useful for the material characterization of nanometer-size areas. Various attributes of the microscope became apparent with reference to the results of different studies. These include better convergence of the electron beam (demonstrated by examination of an MoS2 thin film), high-resolution transmission electron microscopy (using a gold film), high-resolution scanning electron microscopy (with a carbon film containing nanometer-size holes), high-angle resolution electron diffraction (of an iron carbide film), and precision x-ray analysis of nanometer-size areas (using a pyroxene crystal and a Cu---Zn---Al shape memory alloy). |