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电镀铬添加剂的对比研究
引用本文:周琦,史敬伟,程秀莲.电镀铬添加剂的对比研究[J].电镀与精饰,2006,28(2):37-39.
作者姓名:周琦  史敬伟  程秀莲
作者单位:沈阳理工大学,辽宁,沈阳,110168;沈阳理工大学,辽宁,沈阳,110168;沈阳理工大学,辽宁,沈阳,110168
摘    要:以碘酸钾、三氯乙酸、甘氨酸和甲酸为添加剂,加入到标准镀铬液中,测定了镀液的分散能力、光亮电流密度范围、深镀能力、阴极电流效率。结果表明:甲酸使阴极电流效率和深镀能力较高;甘氨酸使分散能力较高。二者均能扩大光亮电流密度范围。三氟乙酸、碘酸钾能显著提高阴极电流效率,但镀层粗糙发暗。

关 键 词:镀铬  添加剂  电流效率  分散能力  深镀能力
文章编号:1001-3849(2006)02-0037-03
收稿时间:2005-04-25
修稿时间:2005年4月25日

Comparative Study on Chromium Plating Additives
ZHOU Qi,SHI Jing-wei,CHENG Xiu-lian.Comparative Study on Chromium Plating Additives[J].Plating & Finishing,2006,28(2):37-39.
Authors:ZHOU Qi  SHI Jing-wei  CHENG Xiu-lian
Affiliation:Shenyang Ligong University, Shenyang 110168, China
Abstract:Potassium iodate, trichloroacetic acid, glycine and formic acid were added respectively to the standard chromium plating bath as an additive. Throwing power, covering power, bright deposit current density range and cathodic current efficience of the bath were measured. The results show that glycine and formic acid both can extend the bright deposit current density range with higher throwing power for the former and higher cathodic current efficience for the latter. Potassium iodate and trichloroacetic acid can both increase cathodic current efficiency markedly but the chromium deposits are dark and rough.
Keywords:chromium plating  additive  current efficience  throwing power  covering power
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