基于响应曲面法的溅射沉积薄膜工艺参数优化

为了研制出适用于高温等恶劣环境且性能优良的用于切削力测量的合金薄膜传感器,结合新型合金薄膜材料的基本性能和离子束、磁控溅射技术,研究了新型薄膜传感器的制作工艺,建立了影响薄膜溅射速率的试验分析模型,研究了氩气流量、氩气工作压强及溅射功率三个因素对薄膜溅射速率的影响,应用响应曲面法对模型进行了优化,并运用方差分析检验了该预测模型的拟合度,建立了溅射速率的等值线和响应面,从而确定了各因素的最佳水平范围,实现了工艺参数的优化。

Optimization of Process Parameters for Thin Film Depositionby Sputtering Based on Response Surface Method

In order to develop an alloy thin film sensor for measuring cutting force which suitable for harsh environment such as high-temperature and has excellent performance,based on the basic properties of new alloy thin film materials and the ion beam and magnetron sputtering technology,the fabrication process of a novel thin film sensor was studied,and a test model was established to analyze the influence on the sputtering rate.Then,the effects of argon flow rate,argon pressure and sputtering power on the sputtering rate were investigated,and the model was optimized by using response surface method.Finally,the variance analysis was used to test the fitting degree of the prediction model,and the contour line and response surface of the sputtering rate were established,so as to the optimal level range of each factor was determined,and optimization of process parameters was achieved.