首页 | 本学科首页   官方微博 | 高级检索  
     


Double-level metallurgy defect study
Abstract:A double-level metallurgy (DLM) test chip having purposely induced nonrandom quartz insulation defects (cracks and holes) is used to study the behavior of the defects under accelerated temperature-voltage stress conditions. Data obtained from this stress are analyzed and used to calculate activation energies for an Arrhenius-voltage dependent model.
Keywords:
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号