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Scaling characteristics of the XeF (CA)excimer laser
Authors:Dane   C.B. Hirst   G.J. Yamaguchi   S. Hofmann   T. Wilson   W.L.   Jr. Sauerbrey   R. Tittel   F.K. Nighan   W.L. Fowler   M.C.
Affiliation:Dept. of Electr. & Comput. Eng., Rice Univ., Houston, TX;
Abstract:The scaling characteristics and medium properties of an injection-controlled XeF(CA) laser pumped by a 10-ns-high current density electron beam have been investigated. A five-component laser gas mixture, consisting of F2, NF3 , Xe, Kr, and Ar was optimized for the scaled laser conditions, resulting in 0.8-J output pulses at 486.8 nm, corresponding to an energy density of small-signal-gain measurements combined with kinetic modeling permitted the characteristics of the dependence of net gain on the electron-beam energy deposition and gas mixture composition, resulting in an improved understanding of XeF(CA) laser operation
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