Scaling characteristics of the XeF (C→A)excimer laser |
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Authors: | Dane C.B. Hirst G.J. Yamaguchi S. Hofmann T. Wilson W.L. Jr. Sauerbrey R. Tittel F.K. Nighan W.L. Fowler M.C. |
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Affiliation: | Dept. of Electr. & Comput. Eng., Rice Univ., Houston, TX; |
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Abstract: | The scaling characteristics and medium properties of an injection-controlled XeF(C→A) laser pumped by a 10-ns-high current density electron beam have been investigated. A five-component laser gas mixture, consisting of F2, NF3 , Xe, Kr, and Ar was optimized for the scaled laser conditions, resulting in 0.8-J output pulses at 486.8 nm, corresponding to an energy density of small-signal-gain measurements combined with kinetic modeling permitted the characteristics of the dependence of net gain on the electron-beam energy deposition and gas mixture composition, resulting in an improved understanding of XeF(C→A) laser operation |
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