MASS SELECTED ION BEAM DEPOSITION: A TOOL FOR PARAMETRIC GROWTH STUDIES, PROCESS DEVELOPMENT AND FABRICATION OF DIAMONDLIKE FILMS

Diamondlike films have unique properties that can be tailored between those of diamond and those of graphite to meet industrial applications. The purpose of this review is to emphasize the ability to prepare films with specific properties through control of the deposition parameters. The three basic approaches, plasma deposition, chemical vapor deposition, and ion beam deposition, are presented. Since the first two methods consist of complex chemical-physical systems which limit the possibilities for controlled parametric studies, the focus herein is on the latter technique. This work presents the unique capabilities of mass-selected carbon ion beam deposition in controlling deposition parameters over a wide range, particularly when combined with in-situ analysis of film evolution. The role of different deposition parameters on diamond film growth is discussed. The Houston deposition system that manifests the above features is described. A summary of results of some ongoing experiments is given to demonstrate the system capabilities for both parametric studies of diamondlike film growth and actual production of diamondlike films.