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Fabrication of Fine-Grained Si3N4-Si2N2O Composites by Sintering Amorphous Nano-sized Silicon Nitride Powders
引用本文:骆俊廷. Fabrication of Fine-Grained Si3N4-Si2N2O Composites by Sintering Amorphous Nano-sized Silicon Nitride Powders[J]. 武汉理工大学学报(材料科学英文版), 2006, 21(3): 97-99. DOI: 10.1007/BF02840891
作者姓名:骆俊廷
作者单位:National Key
摘    要:1 IntroductionAs high-temperature structure materials ,nitride ce-ramics possess the excellent mechanical properties ,highmelting temperature ,low density, high elastic modulusand strength, and good resistance to creep, wear andoxidation[1-3]. The intrinsic brittleness and hardness ofsilicon nitride ceramics , however , make it difficult andcostly to machine into complex-shaped components[4 ,5].The fracture toughness of sintered silicon nitride ceramicsmust beimprovedif these ceramics areto be…

关 键 词:纳米材料 无定形结构 原位合成 烧结 氮化硅 Si3N4-Si2N2O复合物
收稿时间:2005-04-16
修稿时间:2005-12-24

Fabrication of fine-grained Si3N4-Si2N2O composites by sintering amorphous nano-sized silicon nitride powders
Luo Junting Ph D,Zhang Kaifeng,Wang Guofeng,Han Wenbo. Fabrication of fine-grained Si3N4-Si2N2O composites by sintering amorphous nano-sized silicon nitride powders[J]. Journal of Wuhan University of Technology. Materials Science Edition, 2006, 21(3): 97-99. DOI: 10.1007/BF02840891
Authors:Luo Junting Ph D  Zhang Kaifeng  Wang Guofeng  Han Wenbo
Affiliation:(1) National Key Laboratory of Precision Hot Processing, Harbin Institute of Technology, 150001 Harbin, China
Abstract:Si3N4-Si2N2O composites were fabricated with amorphous nano-sized silicon nitride powders by the liquid phase sintering (LPS). The Si2N2O phase was generated by an in-situ reaction 2Si3N4(s)+1.5 O2(g)=3Si2N2O(s)+N2(g). The content of Si2N2O phase up to 60% in the volume was obtained at a sintering temperature of 1650°C and reduced when the sintering temperature increased or decreased, indicating the reaction is reversible. The mass loss, relative density and average grain size increased with increasing the sintering temperature. The average grain size was less than 500 nm when the sintering temperature was below 1700°C. The sintering procedure contains a complex crystallization and a phase transition: amorphous silicon nitride→equiaxial α-Si3N4→equiaxial β-Si3N4→rod-like Si2N2O→needle-like β-Si3N4. Small round-shaped β-Si3N4 particles were entrapped in the Si2N2O grains and a high density of staking faults was situated in the middle of Si2N2O grains at a sintering temperature of 1650°C. The toughness increased from 3.5 MPa·m1/2 at 1600°C to 7.2 MPa·m1/2 at 1800°C. The hardness was as high as 21.5 GPa (Vickers) at 1600°C. Funded by the National Science Foundation of China (No. 50375037)
Keywords:Si3N4-Si2N2O composite  in-situ reaction  amorphous nano-sized silicon nitride
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