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化学机械抛光在光学晶体加工中的应用
引用本文:储向峰,汤丽娟,董永平,乔红斌,朱小华. 化学机械抛光在光学晶体加工中的应用[J]. 金刚石与磨料磨具工程, 2012, 32(1): 23-28,33
作者姓名:储向峰  汤丽娟  董永平  乔红斌  朱小华
作者单位:安徽工业大学化学化工学院,安徽,马鞍山243002
基金项目:国家自然科学基金资助项目
摘    要:晶体材料的深入研究加速了现代科学技术的发展,其需求量也迅速增加。在很多应用领域要求晶体的表面超光滑,因此晶体表面处理和加工成为目前研究的热点。介绍了几种典型光学晶体(蓝宝石晶体、铌酸锂晶体、三硼酸锂晶体、碲锌镉晶体、氧化镁晶体、碳化硅晶体和锑化铟晶体)化学机械抛光的最新研究成果,并探讨了光学晶体化学机械抛光存在的问题及发展趋势。

关 键 词:晶体  表面加工  化学机械抛光

Application of chemical mechanical polishing in the processing of optical crystals
CHU Xiang-feng , TANG Li-juan , DONG Yong-ping , QIAO Hong-bin , ZHU Xiao-hua. Application of chemical mechanical polishing in the processing of optical crystals[J]. Diamond & Abrasives Engineering, 2012, 32(1): 23-28,33
Authors:CHU Xiang-feng    TANG Li-juan    DONG Yong-ping    QIAO Hong-bin    ZHU Xiao-hua
Affiliation:( School of Chemistry and Chemical Engineering, Anhui University of Technology, Maanshan 243002, Anhui, China)
Abstract:Intensive investigation on crystal materials accelerated the development of modern science and technology, and the demand for various crystals has been increasing. The surface processing of crystals has become a research focus because ultra-smooth surface is needed in many application fields. In this research, we introduce the development of chemical mechanical polishing of a few kinds of crystals including saphire, LiNbO3 , LiB305 , CdZnTe, MgO, SiC and InSb, discuss the existing problems and the developing trend in the CMP field of the crystals.
Keywords:crystals  surface processing  chemical mechanical polishing
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