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软X射线偏折仪用自支撑莫尔光栅研制
引用本文:徐向东,洪义麟,刘颖,傅绍军,王占山. 软X射线偏折仪用自支撑莫尔光栅研制[J]. 微细加工技术, 2005, 0(1): 38-42
作者姓名:徐向东  洪义麟  刘颖  傅绍军  王占山
作者单位:1. 中国科学技术大学,国家同步辐射实验室,合肥,230029;同济大学,物理系,上海,200092
2. 中国科学技术大学,国家同步辐射实验室,合肥,230029
3. 同济大学,物理系,上海,200092
摘    要:介绍了莫尔光栅制作的主要方法和进展。利用紫外光刻、离子束刻蚀技术制作自支撑金莫尔光栅,讨论了金膜厚度要求、电镀金膜质量和光栅占空比控制等影响莫尔光栅质量的关键技术问题。实验结果表明,通过设计较小占空比的光栅掩模、紫外光刻时擦除基片边缘的光刻胶棱以消除衍射效应、离子束刻蚀时基片倾斜一定的角度旋转刻蚀等措施可以改善自支撑金莫尔光栅的占空比。

关 键 词:软X射线激光 Ronchi光栅 紫外光刻 离子束刻蚀
文章编号:1003-8213(2005)01-0038-05
修稿时间:2004-08-12

Fabrication of the Freestanding Moire Gratings for Soft X-ray Deflectometry
XU Xiang-dong,HONG Yi-lin,LIU Ying,FU Shao-jun,WANG Zhan-shan. Fabrication of the Freestanding Moire Gratings for Soft X-ray Deflectometry[J]. Microfabrication Technology, 2005, 0(1): 38-42
Authors:XU Xiang-dong  HONG Yi-lin  LIU Ying  FU Shao-jun  WANG Zhan-shan
Affiliation:XU Xiang-dong~
Abstract:The main developments of the research in fabrication of Moire gratings (or Ronchi gratings) are introduced. A novel technique has been successfully developed to fabricate freestanding gold Moire gratings with ultraviolet (UV) lithography and ion beam etching. The key techniques,which affect grating characteristics, are presented, such as the gold film thickness and its quality and the grating duty cycle control. The experimental results show that the duty cycle of gratings can be considerably improved through the following techniques: designing the grating mask with small duty cycle, erasing the resist arris at the substrate edge to eliminate the refraction effect when doing UV lithography and rotating the tilted substrate when doing ion beam etching.
Keywords:soft X-ray laser  Ronchi grating  UV lithography  ion beam etching
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